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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 16 — Jun. 1, 1999
  • pp: 3614–3620

Measurement of the electron-phonon coupling factor dependence on film thickness and grain size in Au, Cr, and Al

John L. Hostetler, Andrew N. Smith, Daniel M. Czajkowsky, and Pamela M. Norris  »View Author Affiliations


Applied Optics, Vol. 38, Issue 16, pp. 3614-3620 (1999)
http://dx.doi.org/10.1364/AO.38.003614


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Abstract

Femtosecond thermoreflectance data for thin films and bulk quantities of Au, Cr, and Al are compared with the parabolic two-step thermal diffusion model for the purpose of determining the electron-phonon coupling factor. The thin films were evaporated and sputtered onto different substrates to produce films that vary structurally. The measurement of the electron-phonon coupling factor is shown to be sensitive to grain size and film thickness. The thin-film thermoreflectance data are compared with that of the corresponding bulk material and to a theoretical model relating the coupling rate to the grain-boundary scattering and size effects on the mean free path of the relevant energy carrier.

© 1999 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0310) Optics at surfaces : Thin films
(260.3910) Physical optics : Metal optics
(350.5340) Other areas of optics : Photothermal effects

History
Original Manuscript: October 26, 1998
Revised Manuscript: February 11, 1999
Published: June 1, 1999

Citation
John L. Hostetler, Andrew N. Smith, Daniel M. Czajkowsky, and Pamela M. Norris, "Measurement of the electron-phonon coupling factor dependence on film thickness and grain size in Au, Cr, and Al," Appl. Opt. 38, 3614-3620 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-16-3614

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