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Applied Optics

Applied Optics


  • Vol. 38, Iss. 2 — Jan. 10, 1999
  • pp: 339–351

Highly corrected submicrometer grid patterning on curved surfaces

Kenneth M. Baker  »View Author Affiliations

Applied Optics, Vol. 38, Issue 2, pp. 339-351 (1999)

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A compact holographic projector system was built and tested. This projection system offers a practical approach for making a highly corrected mesh or grid pattern on curved surfaces. The pattern can range in size from multimicrometer to submicrometer dimensions and be recorded in either positive or negative photoresist. Standing-wave interference patterns in the form of a diverging close-packed lattice of either hexagonal or square rodlike intensity maxima extending outward from a point or a locus of points are produced by multiple-beam holography that involves the combination of a holographic diffraction grating and a hypercomatic focusing objective.

© 1999 Optical Society of America

OCIS Codes
(090.2880) Holography : Holographic interferometry
(110.3960) Imaging systems : Microlithography

Original Manuscript: May 18, 1998
Revised Manuscript: September 9, 1998
Published: January 10, 1999

Kenneth M. Baker, "Highly corrected submicrometer grid patterning on curved surfaces," Appl. Opt. 38, 339-351 (1999)

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