Variation of Band-Edge Position with Errors in the Monitoring of Layer Termination Level for Long- and Short-Wave Pass Filters
Applied Optics, Vol. 38, Issue 25, pp. 5447-5451 (1999)
http://dx.doi.org/10.1364/AO.38.005447
Acrobat PDF (115 KB)
Abstract
Optical monitoring of periodic thin-film stacks by the termination of each layer at the same constant photometric level has certain advantages. One of these principal advantages is the error compensation effect in the vicinity of the monitoring wavelength. In this study, we examine, by simulation, the effect of an error in the knowledge of the absolute value of the photometric termination level on the probable stability in the manufacture of the edge position of a blocked band. The results include equations that allow the determination of the appropriate values of parameters associated with the optimum termination levels to minimize the effects of such errors.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
Citation
Ronald R. Willey and David E. Machado, "Variation of Band-Edge Position with Errors in the Monitoring of Layer Termination Level for Long- and Short-Wave Pass Filters," Appl. Opt. 38, 5447-5451 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-25-5447
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Emission Pattern of Real Vapor Sources in High Vacuum: An Overview (AO)
- Interference Coatings Based on Synthesized Silicon Nitride (AO)
- Correction Masks for Thickness Uniformity in Large-Area Thin Films (AO)
- Ion-Assisted Deposition of Oxide Materials at Room Temperature by use of Different Ion Sources (AO)
- Infrared Optical Filters for the Infrared Atmospheric Sounding Interferometer Meteorological Space Instrument (AO)
Related Conference Papers
- Diode-Pumped Garnet Crystal Waveguide Structures Fabricated by Pulsed Laser Deposition
- Ultra-Fast Lasers for Nano-Material Growth and Processing
- Extremely Thin, Single-Crystal Films of LiNbO3 Fabricated Using localized He+ Ion-Implantation
- Improved Light Extraction from LEDs Utilizing Nonplanar Dielectric Layers from Shadow Mask Deposition
- Infrared (3.75 µm) Interband Cascade Light Emitting Diode Arrays with High Brightness
« Previous Article | Next Article »
OSA is a member of 