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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 38, Iss. 7 — Mar. 1, 1999
  • pp: 1237–1243

Deposition of SiO2 Films with High Laser Damage Thresholds by Ion-Assisted Electron-Beam Evaporation

Marco Alvisi, Giorgio De Nunzio, Massimo Di Giulio, Maria Cristina Ferrara, Maria Rita Perrone, Lucia Protopapa, and Lorenzo Vasanelli  »View Author Affiliations


Applied Optics, Vol. 38, Issue 7, pp. 1237-1243 (1999)
http://dx.doi.org/10.1364/AO.38.001237


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Abstract

SiO<sub>2</sub> thin films (≈100 nm thick) with transmittivity and a laser damage threshold nearly equal to those of bulk material are deposited on silica substrates by the technique of ion-assisted electron-beam evaporation. The influence of film packing density on the laser damage threshold is investigated by the technique of photoacoustic probe beam deflection. It is shown that films with lower packing density may have a higher laser damage threshold and as a consequence better heat dissipation.

© 1999 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

Citation
Marco Alvisi, Giorgio De Nunzio, Massimo Di Giulio, Maria Cristina Ferrara, Maria Rita Perrone, Lucia Protopapa, and Lorenzo Vasanelli, "Deposition of SiO2 Films with High Laser Damage Thresholds by Ion-Assisted Electron-Beam Evaporation," Appl. Opt. 38, 1237-1243 (1999)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-38-7-1237


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References

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