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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 1 — Jan. 1, 2000
  • pp: 20–25

Contrast in the evanescent near field of λ/20 period gratings for photolithography

Sharee J. McNab and Richard J. Blaikie  »View Author Affiliations


Applied Optics, Vol. 39, Issue 1, pp. 20-25 (2000)
http://dx.doi.org/10.1364/AO.39.000020


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Abstract

Light propagation through gratings with periods as small as λ/20 is investigated computationally by use of the multiple multipole method in two dimensions. High image contrast is evident close to the grating. Strong evanescent decay of the high spatial frequency components is observed with the region of high contrast shrinking linearly as the period of the grating is decreased. Simulations were performed for TE and TM polarizations with the TM polarization providing the dominant contrast compared with TE, which is strongly attenuated owing to the polarizing effect of the gratings. These results show good promise for optical contact lithography in the evanescent near field of a shadow mask to attain feature sizes smaller than λ/20.

© 2000 Optical Society of America

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(050.1950) Diffraction and gratings : Diffraction gratings
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication
(260.5430) Physical optics : Polarization

History
Original Manuscript: June 21, 1999
Revised Manuscript: September 10, 1999
Published: January 1, 2000

Citation
Sharee J. McNab and Richard J. Blaikie, "Contrast in the evanescent near field of λ/20 period gratings for photolithography," Appl. Opt. 39, 20-25 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-1-20

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