Abstract

Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg₂Si, and InSb and of evaporated Cr have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to 200.0 nm. In this spectral region no optical constant data were available for materials deposited by ion-beam deposition. We compared our data with those for bulk samples and for thin films prepared by different techniques. The goal of this research has been to study candidate materials for multilayer coatings in the EUV.

© 2000 Optical Society of America

In situ reflectance and optical constants of ion-beam-sputtered SiC films in the 58.4 to 149.2 nm region

Mónica Fernández-Perea, José A. Méndez, José A. Aznárez, and Juan I. Larruquert
Appl. Opt. 48(24) 4698-4702 (2009)

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

Paul B. Mirkarimi, Sasa Bajt, and Mark A. Wall
Appl. Opt. 39(10) 1617-1625 (2000)

Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

Denis Garoli, F. Frassetto, G. Monaco, P. Nicolosi, M.-G. Pelizzo, F. Rigato, V. Rigato, A. Giglia, and S. Nannarone
Appl. Opt. 45(22) 5642-5650 (2006)

Optical properties of hot-pressed B₄C in the extreme ultraviolet

Juan I. Larruquert and Ritva A. M. Keski-Kuha
Appl. Opt. 39(10) 1537-1540 (2000)

Self-consistent optical constants of SiC thin films

Juan I. Larruquert, Antonio P. Pérez-Marín, Sergio García-Cortés, Luis Rodríguez-de Marcos, José A. Aznárez, and José A. Méndez
J. Opt. Soc. Am. A 28(11) 2340-2345 (2011)