Electron-Beam-Fabricated Asymmetric Transmission Gratings for Microspectroscopy
Applied Optics, Vol. 39, Issue 19, pp. 3187-3191 (2000)
http://dx.doi.org/10.1364/AO.39.003187
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Abstract
Asymmetric transmission gratings operating in the resonance domain are designed by modeling of the dose-controlled electron-beam lithography process with Gaussian convolution. We aim to exceed some efficiency limit ηs over a specified spectral range and to maximize ηs. The resultant continuous-profile gratings are fabricated by electron-beam lithography and proportional reactive-ion etching into SiO2. We demonstrate gratings with good signal-to-noise ratio and a diffraction efficiency greater than 40% for wavelengths from 400 to 750 nm.
© 2000 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.1970) Holography : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
Citation
Pasi Laakkonen, Markku Kuittinen, Janne Simonen, and Jari Turunen, "Electron-Beam-Fabricated Asymmetric Transmission Gratings for Microspectroscopy," Appl. Opt. 39, 3187-3191 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-19-3187
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