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Applied Optics

Applied Optics


  • Vol. 39, Iss. 4 — Feb. 1, 2000
  • pp: 489–493

Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method

Kenji Kintaka, Junji Nishii, and Noboru Tohge  »View Author Affiliations

Applied Optics, Vol. 39, Issue 4, pp. 489-493 (2000)

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Photosensitive ZrO2 gel films were patterned with a two-beam interference method by use of a 325-nm-wavelength He–Cd laser for the first time to our knowledge. The ZrO2 gel films were prepared from Zr(O-n-C4H9)4 chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-µm period on Si or SiO2 substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He–Ne laser. Blazed gratings could also be fabricated.

© 2000 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(160.6060) Materials : Solgel
(220.4610) Optical design and fabrication : Optical fabrication
(230.4000) Optical devices : Microstructure fabrication

Original Manuscript: May 3, 1999
Revised Manuscript: September 14, 1999
Published: February 1, 2000

Kenji Kintaka, Junji Nishii, and Noboru Tohge, "Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method," Appl. Opt. 39, 489-493 (2000)

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