The characterization of optical multilayer coatings has been a challenging task for thin-film scientists and engineers because of the various complex, interdependent layer parameters that exist in the system. Spectroscopic phase-modulated ellipsometry has some advantages in the postanalysis of the layer parameters of such multilayer coatings because it suitably models the layer structure with respect to the ellipsometric measurements. An algorithm to characterize multilayer optical coatings with large numbers of layers has been described by spectroscopic ellipsometry by use of a discrete spectral zone fitting approach. A 23-layer multilayer highly reflecting mirror has been characterized by this technique in the wavelength range 280–1000 nm. The ellipsometric spectra (Ψ and Δ versus wavelength) have been fitted separately in three wavelength regimes. Fitting the ellipsometric spectra in the wavelength regime of 700–1000 nm permitted the sample structure to be determined. The data were then fitted in the wavelength range 280–340 nm, i.e., near the fundamental absorption edge of TiO<sub>2</sub>, to yield the dispersion relation for the optical constants of TiO<sub>2</sub>. Finally, the data were fitted in the wavelength range 340–700 nm, and the true dispersion of the refractive index of TiO<sub>2</sub>, along with the best-fitting sample structure, was obtained.
© 2001 Optical Society of America
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(160.4670) Materials : Optical materials
(230.4170) Optical devices : Multilayers
(310.6860) Thin films : Thin films, optical properties
Dibyendu Bhattacharyya, Naba K. Sahoo, Sudhakar Thakur, and Nimai C. Das, "Characterization of a Multilayer Highly Reflecting Mirror by Spectroscopic Phase-Modulated Ellipsometry," Appl. Opt. 40, 1707-1714 (2001)