Abstract
The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick–Baez (K–B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K–B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory’s Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K–B system designs in general.
© 2001 Optical Society of America
Full Article | PDF ArticleMore Like This
Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Chang Hyun Cho, SeongTae Jeong, and Jeffrey Bokor
Appl. Opt. 40(16) 2655-2661 (2001)
Patrick P. Naulleau, Kenneth A. Goldberg, Sang H. Lee, Chang Chang, David Attwood, and Jeffrey Bokor
Appl. Opt. 38(35) 7252-7263 (1999)
John F. Seely, Charles M. Brown, Glenn E. Holland, Frederick Hanser, John Wise, James L. Weaver, Raj Korde, Rodney A. Viereck, Richard Grubb, and Darrell L. Judge
Appl. Opt. 40(10) 1623-1630 (2001)