Abstract

We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications.

© 2001 Optical Society of America

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

M. A. Klosner and W. T. Silfvast
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