The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, V b . The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to V b , and a high compressive stress of -0.467 GPa was measured at V b = 850 V. The Nb2O5–SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film.
© 2002 Optical Society of America
Original Manuscript: May 9, 2001
Revised Manuscript: October 2, 2001
Published: April 1, 2002
Cheng-Chung Lee, Chuen-Lin Tien, and Jin-Cherng Hsu, "Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering," Appl. Opt. 41, 2043-2047 (2002)