Internal Stress and Optical Properties of Nb2O5 Thin Films Deposited by Ion-Beam Sputtering
Applied Optics, Vol. 41, Issue 10, pp. 2043-2047 (2002)
http://dx.doi.org/10.1364/AO.41.002043
Acrobat PDF (271 KB)
Abstract
The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, Vb. The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to Vb, and a high compressive stress of −0.467 GPa was measured at Vb = 850 V. The Nb2O5–SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
Citation
Cheng-Chung Lee, Chuen-Lin Tien, and Jin-Cherng Hsu, "Internal Stress and Optical Properties of Nb2O5 Thin Films Deposited by Ion-Beam Sputtering," Appl. Opt. 41, 2043-2047 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-10-2043
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