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Applied Optics

Applied Optics


  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3061–3067

Deposition of a conductive near-infrared cutoff filter by radio-frequency magnetron sputtering

Jang-Hoon Lee, Seung-Hyu Lee, Kwang-Lim Yoo, Nam-Young Kim, and Chang Kwon Hwangbo  »View Author Affiliations

Applied Optics, Vol. 41, Issue 16, pp. 3061-3067 (2002)

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We have designed a conductive near-infrared (NIR) cutoff filter for display application, i.e., a modified low-emissivity filter based on the three periods of the basic design of [TiO2|Ti|Ag| TiO2] upon a glass substrate and investigated the optical, structural, chemical, and electrical properties of the conductive NIR cutoff filter prepared by a radio frequency magnetron sputtering system. The results show that the average transmittance is 61.1% in the visible, that the transmittance in the NIR is less than 6.6%, and that the sheet resistance and emissivity are 0.9 Ω/□ (where □ stands for a square film) and 0.012, respectively, suggesting that the conductive NIR cutoff filter can be employed as a shield against the hazard of electromagnetic waves as well as to cut off the NIR.

© 2002 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(240.0310) Optics at surfaces : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
(350.2460) Other areas of optics : Filters, interference

Original Manuscript: September 10, 2001
Revised Manuscript: December 11, 2001
Published: June 1, 2002

Jang-Hoon Lee, Seung-Hyu Lee, Kwang-Lim Yoo, Nam-Young Kim, and Chang Kwon Hwangbo, "Deposition of a conductive near-infrared cutoff filter by radio-frequency magnetron sputtering," Appl. Opt. 41, 3061-3067 (2002)

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