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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3248–3255

Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement

Minoru Otani, Ryuji Biro, Chidane Ouchi, Masanobu Hasegawa, Yasuyuki Suzuki, Kazuho Sone, Shunsuke Niisaka, Tadahiko Saito, Jun Saito, Akira Tanaka, and Akira Matsumoto  »View Author Affiliations


Applied Optics, Vol. 41, Issue 16, pp. 3248-3255 (2002)
http://dx.doi.org/10.1364/AO.41.003248


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Abstract

The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor’s coating design by that vendor’s coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.

© 2002 Optical Society of America

OCIS Codes
(140.2180) Lasers and laser optics : Excimer lasers
(290.5820) Scattering : Scattering measurements
(300.1030) Spectroscopy : Absorption
(300.6540) Spectroscopy : Spectroscopy, ultraviolet
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: September 21, 2001
Revised Manuscript: January 8, 2002
Published: June 1, 2002

Citation
Minoru Otani, Ryuji Biro, Chidane Ouchi, Masanobu Hasegawa, Yasuyuki Suzuki, Kazuho Sone, Shunsuke Niisaka, Tadahiko Saito, Jun Saito, Akira Tanaka, and Akira Matsumoto, "Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement," Appl. Opt. 41, 3248-3255 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3248


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References

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