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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 22 — Aug. 1, 2002
  • pp: 4519–4525

Direct numerical inversion method for kinetic ellipsometric data. II. Implementation and experimental verification

Alfred Hofrichter, Dmitri Kouznetsov, Pavel Bulkin, and Bernard Drévillon  »View Author Affiliations


Applied Optics, Vol. 41, Issue 22, pp. 4519-4525 (2002)
http://dx.doi.org/10.1364/AO.41.004519


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Abstract

A direct numerical inversion method is applied to the monitoring of thin-film growth. Several improvements of the method, including a correction for weakly absorbing materials, are presented. The method has been successfully applied to the inversion of the growth of constant-refractive-index layers and used for the process calibration of plasma-enhanced chemical vapor deposition of silicon oxynitrides. The validity of this calibration has been successfully tested on a linear index gradient and quintic matching layer between a polycarbonate substrate and a scratch-resistant coating.

© 2002 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(160.4760) Materials : Optical properties
(200.3050) Optics in computing : Information processing
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: April 5, 2001
Revised Manuscript: October 15, 2001
Published: August 1, 2002

Citation
Alfred Hofrichter, Dmitri Kouznetsov, Pavel Bulkin, and Bernard Drévillon, "Direct numerical inversion method for kinetic ellipsometric data. II. Implementation and experimental verification," Appl. Opt. 41, 4519-4525 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-22-4519


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References

  1. D. Kouznetsov, A. Hofrichter, B. Drévillon, “Direct numerical inversion method for kinetic ellipsometric data. I. Presentation of the method and numerical evaluation,” Appl. Opt. 41, 4510–4518 (2002). [CrossRef] [PubMed]
  2. P. Bulkin, N. Bertrand, B. Drévillon, “Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor,” Thin Solid Films 296, 66–68 (1997). [CrossRef]
  3. B. Drévillon, “Phase modulated ellipsometry from the ultraviolet to the infrared: in situ applications to the growth of semiconductors,” Prog. Cryst. Growth Charact. Mater. 27, 1–87 (1993). [CrossRef]
  4. T. Heitz, A. Hofrichter, P. Bulkin, B. Drévillon, “Real time control of plasma deposited optical filters by multiwavelength ellipsometry,” J. Vac. Sci. Technol. A 18, 1303–1307 (2000). [CrossRef]
  5. W. H. Southwell, R. L. Hall, “Rugate filter sidelobe suppression using quintic and rugated quintic matching layers,” Appl. Opt. 28, 2949–2951 (1989). [CrossRef] [PubMed]

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