Additive lithography for fabrication of diffractive optics
Applied Optics, Vol. 41, Issue 29, pp. 6176-6181 (2002)
http://dx.doi.org/10.1364/AO.41.006176
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Abstract
An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.5220) Imaging systems : Photolithography
Citation
Mahesh Pitchumani, Heidi Hockel, Waleed Mohammed, and Eric G. Johnson, "Additive lithography for fabrication of diffractive optics," Appl. Opt. 41, 6176-6181 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-29-6176
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