In the framework of current developments in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.
© 2002 Optical Society of America
Original Manuscript: April 25, 2002
Revised Manuscript: August 26, 2001
Published: December 1, 2002
Mathias Richter, Udo Kroth, Alexander Gottwald, Christopher Gerth, Kai Tiedtke, Terubumi Saito, Ivan Tassy, and Klaus Vogler, "Metrology of pulsed radiation for 157-nm lithography," Appl. Opt. 41, 7167-7172 (2002)