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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 34 — Dec. 2, 2002
  • pp: 7167–7172

Metrology of pulsed radiation for 157-nm lithography

Mathias Richter, Udo Kroth, Alexander Gottwald, Christopher Gerth, Kai Tiedtke, Terubumi Saito, Ivan Tassy, and Klaus Vogler  »View Author Affiliations


Applied Optics, Vol. 41, Issue 34, pp. 7167-7172 (2002)
http://dx.doi.org/10.1364/AO.41.007167


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Abstract

In the framework of current developments in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.

© 2002 Optical Society of America

OCIS Codes
(040.5160) Detectors : Photodetectors
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5630) Instrumentation, measurement, and metrology : Radiometry

History
Original Manuscript: April 25, 2002
Revised Manuscript: August 26, 2001
Published: December 1, 2002

Citation
Mathias Richter, Udo Kroth, Alexander Gottwald, Christopher Gerth, Kai Tiedtke, Terubumi Saito, Ivan Tassy, and Klaus Vogler, "Metrology of pulsed radiation for 157-nm lithography," Appl. Opt. 41, 7167-7172 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-34-7167


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References

  1. International SEMATECH, International Technology Roadmap for Semiconductors (International SEMATECH, Austin, Texas, 2001).
  2. U. Stamm, I. Bragin, S. V. Govorkov, J. Kleinschmidt, R. Pätzel, E. Slobodtchikov, K. Vogler, F. Vofl, D. Basting, “Excimer laser for 157-nm lithography,” in Emerging Lithographic Technologies III,Y. Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).
  3. K. Vogler, U. Stamm, I. Bragin, F. Voss, S. Govorkov, G. Hua, J. Kleinschmidt, R. Pätzel, “Advanced F2 lasers for microlithography,” in Optical Microlithography XIII, C. J. Progler, ed., Proc. SPIE4000, 1515–1528 (2000).
  4. K. Solt, H. Melchior, U. Kroth, P. Kuschnerus, V. Persch, H. Rabus, M. Richter, G. Ulm, “PtSi–n–Si Schottky-barrier photodetectors with stable spectral responsivity in the 120–250 nm spectral range,” Appl. Phys. Lett. 69, 3662–3664 (1996). [CrossRef]
  5. P. Kuschnerus, H. Rabus, M. Richter, F. Scholze, L. Werner, G. Ulm, “Characterization of photodiodes as transfer detector standards in the 120 nm to 600 nm spectral range,” Metrologia 35, 355–362 (1998). [CrossRef]
  6. R. Gupta, K. R. Lykke, P. S. Shaw, J. L. Dehmer, “Characterization of UV-induced radiation damage in Si-based photodiodes,” in Ultraviolet Atmospheric and Space Remote Sensing: Methods and Instrumentation II, G. R. Carruthers, K. F. Dymond, eds., Proc. SPIE3818, 27–33 (1999).
  7. L. R. Canfield, R. E. Vest, R. Korde, H. Schmidtke, R. Desor, “Absolute silicon photodiodes for 160 nm to 254 nm photons,” Metrologia 35, 329–334 (1998). [CrossRef]
  8. M. Richter, G. Ulm, “Radiometry using synchrotron radiation at PTB,” J. Electron Spectrosc. Relat. Phenom. 101–103, 1013–1018 (1999). [CrossRef]
  9. H. Rabus, V. Persch, G. Ulm, “Synchrotron-radiation-operated cryogenic electrical-substitution radiometer as the high-accuracy primary detector standard in the ultraviolet, vacuum-ultraviolet, and soft-x-ray spectral ranges,” Appl. Opt. 36, 5421–5440 (1997). [CrossRef] [PubMed]
  10. M. Richter, J. Hollandt, U. Kroth, W. Paustian, R. Thornagel, G. Ulm, “The two normal-incidence monochromator beam lines of PTB at BESSY II,” Nucl. Instrum. Methods 467–468, 605–608 (2001).
  11. M. Richter, F. Becker, K. Grützmacher, U. Kroth, H. Rabus, K. Vogler, E. Bergmann, U. Stamm, “Metrology of laser radiation in the DUV for lithography,” in Laser Beam and Optics Characterization, H. Weber, H. Laabs, eds. (Technische Universität Berlin, Berlin, 2000), pp. 301–303.
  12. M. Richter, U. Kroth, K. Vogler, E. Bergmann, “Metrology of 157 nm laser radiation for lithography,” in BESSY Annual Report (BESSY, Berlin, 2000), pp. 70–71.
  13. P. Kuschnerus, “Quantenausbeute von kristallinem Silicium im Spektralbereich von 40 nm bis 400 nm,” Ph.D. dissertation (Berlin Technical University, Berlin, 2000).
  14. R. E. Vest, L. R. Canfield, “Photoemission from silicon photodiodes and induced changes in the detection efficiency in the far ultraviolet,” in Synchrotron Radiation Instrumentation: Tenth US National Conference, E. Fontes, ed., Vol. 417 of AIP Conference Proceedings (American Institute of Physics, New York, 1997), pp. 234–240.
  15. T. Saito, H. Onuki, in TELL-TERAS Activity Report 1980–1986, T. Tomimasu, ed. (Electrotechnical Laboratory, Tsukuba, Japan, 1987), pp. 128–130.
  16. R. C. Weast, ed., CRC Handbook of Chemistry and Physics, 65th ed. (CRC Press, Boca Raton, Fla., 1984).

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