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Applied Optics

Applied Optics


  • Vol. 41, Iss. 34 — Dec. 2, 2002
  • pp: 7309–7316

Measurements of the Refractive Index of Yttrium in the 50–1300-eV Energy Region

Benjawan Sae-Lao and Regina Soufli  »View Author Affiliations

Applied Optics, Vol. 41, Issue 34, pp. 7309-7316 (2002)

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The first experimental results to our knowledge on the refractive index <i>ñ</i> = 1 − δ + <i>i</i>β of yttrium in the extreme-ultraviolet and soft x-ray energy ranges are discussed. To determine the absorptive part β, transmittance measurements were performed on pure yttrium films in the 50–1300-eV energy region at beamline 6.3.2 of the Advanced Light Source. The dispersive part δ was then calculated from the absorption results by means of the Kramers-Kronig transformation. Compared with prior tabulated values, the new set of data for the refractive index of yttrium is in better agreement with the sum rules and contains previously unresolved fine structure information in the regions of the <i>M</i><sub>2, 3</sub> and <i>M</i><sub>4, 5</sub> absorption edges, where yttrium-based multilayer mirrors operate.

© 2002 Optical Society of America

OCIS Codes
(040.7190) Detectors : Ultraviolet
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(230.4170) Optical devices : Multilayers
(310.6860) Thin films : Thin films, optical properties

Benjawan Sae-Lao and Regina Soufli, "Measurements of the Refractive Index of Yttrium in the 50–1300-eV Energy Region," Appl. Opt. 41, 7309-7316 (2002)

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  1. Information about the Extreme Ultraviolet Explorer mission and the observed spectral lines can be obtained at http://ssl.berkeley.edu/euve.
  2. The experimental Multilayer Survey is available at http://www.cxro.lbl.gov/multilayer/survey.html.
  3. B. Sae-Lao and C. Montcalm, “Molybdenum-strontium multilayer mirrors for the 8–12-nm extreme ultraviolet wavelength region,” Opt. Lett. 26, 468–470 (2001).
  4. B. Sae-Lao and C. Montcalm, “Normal-incidence multilayer mirrors for the 8–12 nm wavelength region,” Advanced Light Source Compendium of User Abstracts 1999; available at http://alspubs.lbl.gov/compendium/.
  5. B. Sae-Lao, S. Bajt, C. Montcalm, and J. F. Seely, “Performance of normal-incidence molybdenum-yttrium multilayer-coated grating at a wavelength of 9 nm,” Appl. Opt. 41, 2394–2400 (2002).
  6. B. L. Henke, E. M. Gullikson, and J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50–30,000 eV, Z = 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993); an updated version of these data is available at http://www-cxro.lbl.gov.
  7. J. Berkowitz, Photoabsorption, Photoionization, and Photoelectron Spectroscopy (Academic, New York, 1979), Chap. 4.
  8. The imd program by D. L. Windt is available at http://www.cletus.phys.columbia.edu/~windt/imd/.
  9. H. J. Hagemann, W. Gudat, and C. Kunz, “Optical constants from the far infrared to the X-ray region: Mg, Al, Cu, Ag, Au, Bi, C, and A12O3,” J. Opt. Soc. Am. 65, 742–744 (1975).
  10. E. M. Gullikson, P. Denham, S. Mrowka, and J. H. Underwood, “Absolute photoabsorption measurements of Mg, Al, and Si in the soft-x-ray region below the L2, 3 edges,” Phys. Rev. B 49, 16283–16288 (1994).
  11. R. Soufli and E. M. Gullikson, “Absolute photoabsorption measurements of molybdenum in the range 60–930 eV for optical constant determination,” Appl. Opt. 37, 1713–1719 (1998).
  12. D. Y. Smith and E. Shiles, “Finite-energy f-sum rules for valence electrons,” Phys. Rev. B. 17, 4689–4694 (1978).
  13. D. Y. Smith, “X-ray optical properties: a review of the constraints and the data base,” in X-ray and VUV Interaction Data Bases, Calculations, and Measurements, N. K. Del Grande, P. Lee, J. A. Samson, and D. Y. Smith, eds., Proc. SPIE 911, 86–99 (1988).
  14. E. Hecht, Optics, 2nd ed. (Addison-Wesley, Readrog, Mass., 1989), Chap. 4.
  15. M. T. Wilson, technical paper available at http://www.puretechinc.com/tech_papers/tech_papers.htm.
  16. F. R. Powell and T. A. Johnson, “Filter windows for EUV lithography,” in Emerging Lithographic Technologies V. E. A. Dobisz, eds., Proc. SPIE 4343, 585–589 (2001).
  17. J. H. Underwood and E. M. Gullikson, “High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300 eV energy region,” J. Electron Spectrosc. Relat. Phenom. 92, 265–272 (1998).
  18. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” in Emerging Lithographic Technologies V, E. A. Dobisz, ed., Proc. SPIE 4343, 363–373 (2001).
  19. J. H. Weaver, C. Krafka, D. W. Lynch, and E. E. Koch, in Physik Daten-Optical Properties of Metals, H. Behrens and G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18–2.

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