Properties of Titanium Dioxide Films Prepared by Reactive Electron-Beam Evaporation from Various Starting Materials
Applied Optics, Vol. 41, Issue 4, pp. 756-762 (2002)
http://dx.doi.org/10.1364/AO.41.000756
Acrobat PDF (246 KB)
Abstract
There is a wide choice of starting materials for the production of titanium dioxide films by reactive electron-beam evaporation. We have investigated the specific merits of these materials in terms of refractive index, stress, and abrasion resistance of the resultant titanium dioxide films. The suboxides TiO, Ti2O3, and Ti3O5 as well as titanium dioxide and titanium metal were reactively evaporated, and titanium dioxide films free of absorption were obtained on substrates at 25 and 250°C. On unheated substrates the refractive index, which varies from 2.06 to 2.22, the stress, and the abrasion resistance all depend on the starting material used. On substrates heated to 250°C the refractive indices of all films lie closely about 2.4, and all films show high tensile stress and good abrasion resistance.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(160.4760) Materials : Optical properties
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
Citation
Hubert Selhofer, Elmar Ritter, and Robert Linsbod, "Properties of Titanium Dioxide Films Prepared by Reactive Electron-Beam Evaporation from Various Starting Materials," Appl. Opt. 41, 756-762 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-4-756
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Interference Coatings Based on Synthesized Silicon Nitride (AO)
- Low-Loss Dielectric Mirror with Ion-Beam-Sputtered TiO 2-SiO 2 Mixed Films (AO)
- Long-Wavelength Polarizing Cutoff Filters for the 275–550-nm Spectral Region (AO)
- High-Reflectivity HfO2/SiO2 Ultraviolet Mirrors (AO)
- Review of the Fundamentals of Thin-Film Growth (AO)
Related Conference Papers
« Previous Article | Next Article »
OSA is a member of 