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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 4 — Feb. 1, 2002
  • pp: 756–762

Properties of titanium dioxide films prepared by reactive electron-beam evaporation from various starting materials

Hubert Selhofer, Elmar Ritter, and Robert Linsbod  »View Author Affiliations


Applied Optics, Vol. 41, Issue 4, pp. 756-762 (2002)
http://dx.doi.org/10.1364/AO.41.000756


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Abstract

There is a wide choice of starting materials for the production of titanium dioxide films by reactive electron-beam evaporation. We have investigated the specific merits of these materials in terms of refractive index, stress, and abrasion resistance of the resultant titanium dioxide films. The suboxides TiO, Ti2O3, and Ti3O5 as well as titanium dioxide and titanium metal were reactively evaporated, and titanium dioxide films free of absorption were obtained on substrates at 25 and 250 °C. On unheated substrates the refractive index, which varies from 2.06 to 2.22, the stress, and the abrasion resistance all depend on the starting material used. On substrates heated to 250°C the refractive indices of all films lie closely about 2.4, and all films show high tensile stress and good abrasion resistance.

© 2002 Optical Society of America

OCIS Codes
(160.4760) Materials : Optical properties
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: June 8, 2001
Revised Manuscript: September 19, 2001
Published: February 1, 2002

Citation
Hubert Selhofer, Elmar Ritter, and Robert Linsbod, "Properties of titanium dioxide films prepared by reactive electron-beam evaporation from various starting materials," Appl. Opt. 41, 756-762 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-4-756

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