The author is with the U.S. Army Soldier and Biological Chemical Command, Edgewood Chemical Biological Center, 5183 Blackhawk Road, Aberdeen Proving Ground, Maryland 21010-5424.
Design and functional aspects of PANSPEC, a panoramic-imaging chemical vapor sensor (PANSPEC is an abbreviation for infrared panoramic-viewing spectroradiometer), were advanced and its optical system reoptimized accordingly. The PANSPEC model unites camera and fused solid-state interferometer and photopolarimeter subsystems. The camera is an eye of the open atmosphere that collects, collimates, and images ambient infrared radiance from a panoramic field of view (FOV). The passive interferometer rapidly measures an infrared-absorbing (or infrared-emitting) chemical cloud traversing the FOV by means of molecular vibrational spectroscopy. The active photopolarimeter system provides a laser beam beacon. This beam carries identification (feature spectra measured by the interferometer) and heading (detector pixels disclosing these feature spectra) information on the hazardous cloud through a binary encryption of Mueller matrix elements. Interferometer and photopolarimeter share a common configuration of photoelastic modulation optics. PANSPEC was optimized for minimum aberrations and maximum resolution of image. The optimized design was evaluated for tolerances in the shaping and mounting of the optical system, stray light, and ghost images at the focal plane given a modulation transfer function metric.
Bogdan R. Cosofret, Daisei Konno, Aram Faghfouri, Harry S. Kindle, Christopher M. Gittins, Michael L. Finson, Tracy E. Janov, Mark J. Levreault, Rex K. Miyashiro, and William J. Marinelli Appl. Opt. 48(10) 1837-1852 (2009)
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Two-layer antireflection coating.
High-reflectance thin aluminum layer.
Circular 5.25-mm maximum radius.
Circular 4.28-nm maximum radius.
Brewster angle.
Rectangular half-widths of 17.018 mm × 20 mm.
Interferometer birefringent in.
Interferometer birefringent out.
Rectangular half-width of 17.018 mm × 36 mm.
50 × 50 square pixel FPA.
Table 2
Vignetting Parameters of the Optimized PANSPEC Sensor Optical Design
Chief ray polar angle θ in the X (horizontal) and Y (vertical plane.
Null decentration of the EP along the X axis.
Decentration of the EP along the +Y axis.
Compression of the EP along the +X axis.
Compression of the EP along the +Y axis.
VD, vignetting decenter; VC, vignetting compression.
Table 3
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ4,4 element is used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (vertical, -45°|+45°, vertical) (case A of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case A.
Table 4
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ3,4 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (vertical, -45°|vertical, -45°) (case B of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case B.
Table 5
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ3,3, ℛ3,4, ℛ4,3 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (+45°, vertical | vertical, -45°) (case C of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case C.
Table 6
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ4,3 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (+45°, vertical | +45°, vertical) (case D of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case D.
Tables (6)
Table 1
Surface Data Summary of the Optimized PANSPEC Sensor Optical Design
Two-layer antireflection coating.
High-reflectance thin aluminum layer.
Circular 5.25-mm maximum radius.
Circular 4.28-nm maximum radius.
Brewster angle.
Rectangular half-widths of 17.018 mm × 20 mm.
Interferometer birefringent in.
Interferometer birefringent out.
Rectangular half-width of 17.018 mm × 36 mm.
50 × 50 square pixel FPA.
Table 2
Vignetting Parameters of the Optimized PANSPEC Sensor Optical Design
Chief ray polar angle θ in the X (horizontal) and Y (vertical plane.
Null decentration of the EP along the X axis.
Decentration of the EP along the +Y axis.
Compression of the EP along the +X axis.
Compression of the EP along the +Y axis.
VD, vignetting decenter; VC, vignetting compression.
Table 3
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ4,4 element is used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (vertical, -45°|+45°, vertical) (case A of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case A.
Table 4
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ3,4 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (vertical, -45°|vertical, -45°) (case B of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case B.
Table 5
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ3,3, ℛ3,4, ℛ4,3 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (+45°, vertical | vertical, -45°) (case C of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case C.
Table 6
Mueller Matrices ℛ for Half-Wave- and Quarter-Wave-Plate States of Optic ℳ19–20 of Fig.
1(b)a
Fundamental and overtone PEM frequencies of modulators M21–22 and M17–18 are ω1 and ω2, respectively. These Mueller elements are produced by a CO2 carrier laser beam transmitting PANSPEC as shown in Fig.
1(a) and the generation of a polarogram from that beam. The ℛ4,3 and ℛ4,4 elements are used for binary encryption. Optical orientations of the photopolarimeter optics of the order of (P24–25, M21–22|M17–18, P13–14) are (+45°, vertical | +45°, vertical) (case D of Refs. 9 and 10).
Scalar element of the Mueller matrix with no polarization dependence.
N.A., not accessible for measurement given case D.