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Applied Optics

Applied Optics


  • Vol. 42, Iss. 25 — Sep. 1, 2003
  • pp: 5064–5072

Symmetry X system and method for absolute measurements of reflectance and transmittance of specular samples

Etsuo Kawate  »View Author Affiliations

Applied Optics, Vol. 42, Issue 25, pp. 5064-5072 (2003)

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A symmetry X system that has been constructed for the absolute measurements of reflectance and transmittance of specular samples in the infrared region is described. The system has been designed so that it can be incorporated into commercial Fourier-transform infrared spectrometers. Although ten mirrors were used in this system, it is disclosed that the geometric mean of two reflectance values is independent of the reflectance difference of the individual mirrors and the optical loss at each mirror. This system achieves spectral measurements with high accuracy and within a short period of time. In particular, the system affords us the self-diagnostic ability for measured spectra, and the simultaneous measurements of reflectance and transmittance under the same geometry enable us to evaluate measurement uncertainties. Although the symmetry X system is used for infrared spectral measurements, the measurement method, design principles, and features are generally applicable to other wavelengths as well.

© 2003 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4570) Instrumentation, measurement, and metrology : Optical design of instruments
(120.5700) Instrumentation, measurement, and metrology : Reflection
(120.7000) Instrumentation, measurement, and metrology : Transmission

Original Manuscript: March 17, 2003
Published: September 1, 2003

Etsuo Kawate, "Symmetry X system and method for absolute measurements of reflectance and transmittance of specular samples," Appl. Opt. 42, 5064-5072 (2003)

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