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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 4 — Feb. 1, 2003
  • pp: 649–656

Absorption of low-loss optical materials measured at 1064 nm by a position-modulated collinear photothermal detection technique

Vincent Loriette and Claude Boccara  »View Author Affiliations


Applied Optics, Vol. 42, Issue 4, pp. 649-656 (2003)
http://dx.doi.org/10.1364/AO.42.000649


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Abstract

A collinear photothermal detection bench is described that makes use of a position-modulated heating source instead of the classic power-modulated source. This new modulation scheme increases by almost a factor 2 the sensitivity of a standard mirage bench. This bench is then used to measure the absorption coefficient of OH-free synthetic fused silica at 1064 nm in the parts per 106 range, which, combined with spectrophotometric measurements, confirms that the dominant absorption source is the OH content.

© 2003 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(160.4760) Materials : Optical properties
(160.6030) Materials : Silica

History
Original Manuscript: May 21, 2002
Revised Manuscript: October 1, 2002
Published: February 1, 2003

Citation
Vincent Loriette and Claude Boccara, "Absorption of low-loss optical materials measured at 1064 nm by a position-modulated collinear photothermal detection technique," Appl. Opt. 42, 649-656 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-4-649

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