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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 5 — Feb. 10, 2003
  • pp: 820–826

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, Jeffrey Bokor, Paul Denham, and Senajith Rekawa  »View Author Affiliations


Applied Optics, Vol. 42, Issue 5, pp. 820-826 (2003)
http://dx.doi.org/10.1364/AO.42.000820


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Abstract

Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm.

© 2003 Optical Society of America

OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(110.7440) Imaging systems : X-ray imaging
(120.4820) Instrumentation, measurement, and metrology : Optical systems

History
Original Manuscript: August 1, 2002
Revised Manuscript: October 28, 2002
Published: February 10, 2003

Citation
Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, Jeffrey Bokor, Paul Denham, and Senajith Rekawa, "Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography," Appl. Opt. 42, 820-826 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-5-820


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References

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