Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography
Applied Optics, Vol. 42, Issue 5, pp. 820-826 (2003)
http://dx.doi.org/10.1364/AO.42.000820
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Abstract
Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm.
© 2003 Optical Society of America
OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(110.7440) Imaging systems : X-ray imaging
(120.4820) Instrumentation, measurement, and metrology : Optical systems
Citation
Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, Jeffrey Bokor, Paul Denham, and Senajith Rekawa, "Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography," Appl. Opt. 42, 820-826 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-5-820
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