Binary gratings were fabricated with high first-order diffraction efficiency by conventional electron-beam drawing and subsequent inductive coupled-plasma dry etching upon the surfaces of SiO2 glass plates. The gratings were covered with a thin SiO2 film by plasma-enhanced chemical-vapor deposition without the grooves’ being filled in. The buried gratings exhibited first-order diffraction efficiencies of 84% for transverse-electric and 87% for transverse-magnetic polarized light at a wavelength of 1.55 μm when the period and the depth were 1.5 and 2.8 μm, respectively.
© 2004 Optical Society of America
Original Manuscript: July 22, 2003
Revised Manuscript: November 7, 2003
Published: February 20, 2004
Junji Nishii, Kenji Kintaka, and Tatsuhiro Nakazawa, "High-efficiency transmission gratings buried in a fused-SiO2 glass plate," Appl. Opt. 43, 1327-1330 (2004)