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Applied Optics

Applied Optics


  • Vol. 44, Iss. 8 — Mar. 10, 2005
  • pp: 1410–1415

Two-dimensional thickness measurements based on internal reflection ellipsometry

Soichi Otsuki, Kaoru Tamada, and Shin-ichi Wakida  »View Author Affiliations

Applied Optics, Vol. 44, Issue 8, pp. 1410-1415 (2005)

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An imaging ellipsometer technique on internal reflection geometry that can measure the thickness distribution of a thin film possessing an assumed refractive index is described. Because a prism is used for the internal reflection geometry, it was theoretically predicted that angular derivation from the normal incidence on the prism surface affects only the Ψ value by a factor of 0.97 at maximum. Measurements were carried out for an optical system of silica substrate–TiO2 layer–silica layer–protein film–air, with a thin-film array of dried protein as the sample film. Thickness of the protein films was two-dimensionally estimated only from the measured map of the Δ value by use of the simulated relationship between the thickness and the Δ value. The thickness map obtained was coincident on the whole with the results according to a mechanical scanning. The detection limit was approximately ±0.2 nm. These findings validate the optical effect of a high-index additional layer to improve the sensitivity and precision of thickness measurements of the sample film on transparent substrates.

© 2005 Optical Society of America

OCIS Codes
(110.2970) Imaging systems : Image detection systems
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(170.3880) Medical optics and biotechnology : Medical and biological imaging

Original Manuscript: August 6, 2004
Revised Manuscript: October 27, 2004
Manuscript Accepted: November 3, 2004
Published: March 10, 2005

Soichi Otsuki, Kaoru Tamada, and Shin-ichi Wakida, "Two-dimensional thickness measurements based on internal reflection ellipsometry," Appl. Opt. 44, 1410-1415 (2005)

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