Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.
© 2006 Optical Society of America
Original Manuscript: March 1, 2005
Revised Manuscript: September 16, 2005
Manuscript Accepted: February 16, 2006
Koichiro Iwahori, Masahiro Furuta, Yusuke Taki, Tomoyuki Yamamura, and Akira Tanaka, "Optical properties of fluoride thin films deposited by RF magnetron sputtering," Appl. Opt. 45, 4598-4602 (2006)