Optical properties of fluoride thin films deposited by RF magnetron sputtering
Applied Optics, Vol. 45, Issue 19, pp. 4598-4602 (2006)
http://dx.doi.org/10.1364/AO.45.004598
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Abstract
Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.
© 2006 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
History
Original Manuscript: March 1, 2005
Revised Manuscript: September 16, 2005
Manuscript Accepted: February 16, 2006
Citation
Koichiro Iwahori, Masahiro Furuta, Yusuke Taki, Tomoyuki Yamamura, and Akira Tanaka, "Optical properties of fluoride thin films deposited by RF magnetron sputtering," Appl. Opt. 45, 4598-4602 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-19-4598
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