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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1375–1379

Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering

Toshiya Yoshida, Keiji Nishimoto, Keiichi Sekine, and Kazuyuki Etoh  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1375-1379 (2006)
http://dx.doi.org/10.1364/AO.45.001375


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Abstract

Optically high quality coatings of fluoride materials are required in deep ultraviolet (DUV) lithography. We have applied ion-beam sputtering (IBS) to obtain fluoride films with smooth surfaces. The extinction coefficients were of the order of 10 - 4 at the wavelength of 193 nm due to the reduction of their absorption loss. The transmittance of the MgF 2 / GdF 3 antireflection coating was as high as 99.7% at the wavelength of 193 nm . The surfaces of the IBS deposited films were so smooth that the surface roughness of the AlF 3 / GdF 3 film was comparable with that of the CaF 2 substrate. The MgF 2 / GdF 3 coating fulfilled the temperature and humidity requirements of military specification. Thus, the IBS deposited fluoride films are promising candidate for use in the DUV lithography optics.

© 2006 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Short and Intense Wavelength Coatings

History
Original Manuscript: March 4, 2005
Manuscript Accepted: July 7, 2005

Citation
Toshiya Yoshida, Keiji Nishimoto, Keiichi Sekine, and Kazuyuki Etoh, "Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering," Appl. Opt. 45, 1375-1379 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1375


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References

  1. T. Yoshida, K. Nishimoto, K. Etoh, and I. Kataoka, 'Development of high-reflection mirrors of fluoride multilayers for F2 excimer laser by ion beam sputtering method,' Jpn. J. Appl. Phys. 41, 5751-5752 (2002). [CrossRef]
  2. B. W. Smith, H. Kang, A. Bourov, F. Cropanese, and Y. Fan, 'Water immersion optical lithography for the 45-nm node,' in Optical Microlithography XVI, A. Yen, ed., Proc. SPIE 5040, 679-682 (2003). [CrossRef]
  3. S. Owa and H. Nagasaki, 'Immersion lithography; its potential performance and issues,' in Optical Microlithography XVI, A. Yen, ed., Proc. SPIE 5040, 724-733 (2003). [CrossRef]
  4. D. Ristau, S. Günster, S. Bosch, A. Duparré, E. Masetti, J. Ferré-Borrull, G. Kiriakidis, F. Peiró, E. Quesnel, and A. Tikhonravov, 'Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation,' Appl. Opt. 41, 3196-3204 (2002). [CrossRef] [PubMed]
  5. Y. Taki, 'Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography,' Vacuum 74, 431-435 (2004). [CrossRef]
  6. J. C. Manifacier, J. Gasiot, and J. P. Fillard, 'A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,' J. Phys. E 9, 1002-1004 (1976). [CrossRef]
  7. H. E. Bennett and J. O. Porteus, 'Relation between surface roughness and specular reflectance at normal incidence,' J. Opt. Soc. Am. 51, 123-129 (1961). [CrossRef]
  8. 'Military Specification MILC-48497A' (U.S. Army Armament Research and Development Command, Dover, New Jersey, 1980).
  9. R. W. G. Wyckoff, Crystal Structures, 2nd ed. (Interscience Publishers, New York, 1963), Vol. 2.
  10. T. Hahn, International Tables for Crystallography Space-Group Symmetry, 4th ed. (Kluwer Academic, Dordrecht, 1995).
  11. T. Yoshida, K. Nishimoto, and K. Etoh, 'Fluoride antireflection multilayers with high transmittance for ArF excimer laser by ion beam sputtering method,' Jpn. J. Appl. Phys. 43, 258-260 (2004). [CrossRef]

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