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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1375–1379

Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering

Toshiya Yoshida, Keiji Nishimoto, Keiichi Sekine, and Kazuyuki Etoh  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1375-1379 (2006)
http://dx.doi.org/10.1364/AO.45.001375


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Abstract

Optically high quality coatings of fluoride materials are required in deep ultraviolet (DUV) lithography. We have applied ion-beam sputtering (IBS) to obtain fluoride films with smooth surfaces. The extinction coefficients were of the order of 10 - 4 at the wavelength of 193 nm due to the reduction of their absorption loss. The transmittance of the MgF 2 / GdF 3 antireflection coating was as high as 99.7% at the wavelength of 193 nm . The surfaces of the IBS deposited films were so smooth that the surface roughness of the AlF 3 / GdF 3 film was comparable with that of the CaF 2 substrate. The MgF 2 / GdF 3 coating fulfilled the temperature and humidity requirements of military specification. Thus, the IBS deposited fluoride films are promising candidate for use in the DUV lithography optics.

© 2006 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Short and Intense Wavelength Coatings

History
Original Manuscript: March 4, 2005
Manuscript Accepted: July 7, 2005

Citation
Toshiya Yoshida, Keiji Nishimoto, Keiichi Sekine, and Kazuyuki Etoh, "Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering," Appl. Opt. 45, 1375-1379 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1375

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