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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1447–1455

Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition

Seouk-Hoon Woo and Chang Kwon Hwangbo  »View Author Affiliations

Applied Optics, Vol. 45, Issue 7, pp. 1447-1455 (2006)

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Effects of thermal annealing at 400 °C on the optical, structural, and chemical properties of TiO 2 single-layer, MgF 2 single-layer, and TiO 2 / MgF 2 narrow-bandpass filters deposited by conventional electron-beam evaporation (CE) and plasma ion-assisted deposition (PIAD) were investigated. In the case of TiO 2 films, the results show that the annealing of both CE and PIAD TiO 2 films increases the refractive index slightly and the extinction coefficient and surface roughness greatly. Annealing decreases the thickness of CE TiO 2 films drastically, whereas it does not vary that of PIAD TiO 2 films. For PIAD MgF 2 films, annealing increases the refractive index and decreases the extinction coefficient drastically. An x-ray photoelectron spectroscopy analysis suggests that an increase in the refractive index and a decrease in the extinction coefficient for PIAD MgF 2 films after annealing may be related to the enhanced concentration of MgO in the annealed PIAD MgF 2 films and the changes in the chemical bonding states of Mg 2 p , F 1 s , and O 1 s . It is found that ( TiO 2 / MgF 2 ) multilayer filters, consisting of PIAD TiO 2 and CE MgF 2 films, are as deposited without microcracks and are also thermally stable after annealing.

© 2006 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Deposition of Optical Coatings

Original Manuscript: March 2, 2005
Revised Manuscript: July 20, 2005
Manuscript Accepted: August 13, 2005

Seouk-Hoon Woo and Chang Kwon Hwangbo, "Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition," Appl. Opt. 45, 1447-1455 (2006)

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