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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1495–1501

Optical broadband monitoring of conventional and ion processes

Detlev Ristau, Henrik Ehlers, Tobias Gross, and Marc Lappschies  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1495-1501 (2006)
http://dx.doi.org/10.1364/AO.45.001495


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Abstract

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. Besides a monochromator system with a moving grating for the deep ultraviolet/vacuum ultraviolet (DUV/VUV) spectral range, two approaches are presented for online spectrophotometers with CCD arrays. The conventional spectrophotometer is considered for the operator-assisted deposition of fluoride coatings applied in the DUV/VUV range. The concepts with CCD arrays are combined with an advanced software tool for an automatic production of optical coatings. An ion-assisted deposition process and ion-beam sputtering are considered for rapid manufacturing of complex layer systems in the visible and near-infrared spectral ranges. The present contribution summarizes and discusses the major aspects of the described combinations.

© 2006 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Monitoring

History
Original Manuscript: March 22, 2005
Manuscript Accepted: June 30, 2005

Citation
Detlev Ristau, Henrik Ehlers, Tobias Gross, and Marc Lappschies, "Optical broadband monitoring of conventional and ion processes," Appl. Opt. 45, 1495-1501 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1495

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