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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1640–1649

Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality

Carole Deumié, Oliver Gilbert, Gaelle Georges, Laurent Arnaud, and Claude Amra  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1640-1649 (2006)
http://dx.doi.org/10.1364/AO.45.001640


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Abstract

Specular ellipsometry is a well-known and efficient technique to characterize surfaces and coatings. This technique has been extended to the measurement of scattered light. We present an experimental setup, using a polarization modulator, which permits us to characterize transition layers and roughness without a calibration procedure. Experimental results are presented concerning transition layers for damage threshold applications and for rough surfaces or bulks.

© 2006 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.0240) Optics at surfaces : Optics at surfaces
(240.5770) Optics at surfaces : Roughness

ToC Category:
Optical Interference Coatings

History
Original Manuscript: March 2, 2005
Revised Manuscript: July 25, 2005
Manuscript Accepted: August 13, 2005

Citation
Carole Deumié, Oliver Gilbert, Gaelle Georges, Laurent Arnaud, and Claude Amra, "Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality," Appl. Opt. 45, 1640-1649 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1640

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