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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 9 — Mar. 20, 2006
  • pp: 1957–1963

Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator

Patrick P. Naulleau, Jason P. Cain, and Kenneth A. Goldberg  »View Author Affiliations


Applied Optics, Vol. 45, Issue 9, pp. 1957-1963 (2006)
http://dx.doi.org/10.1364/AO.45.001957


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Abstract

Extreme-ultraviolet (EUV) lithography remains a leading contender for use in the mass production of nanoelectronics at the 32   nm node. Great progress has been made in all areas of EUV lithography, including the crucial issue of fabrication of diffraction-limited optics. To gain an accurate understanding of the projection optic wavefront error in a completed lithography tool requires lithography-based aberration measurements; however, making such measurements in EUV systems can be challenging. We describe the quantitative lithographic measurement of spherical aberration in a 0.3 numerical aperture. EUV microfield optic. The measurement method is based on use of the unique properties of a programmable coherence illuminator. The results show the optic to have 1   nm rms spherical error, whereas interferometric measurements performed during the alignment of the optic indicated a spherical error of less than 0.1   nm   rms .

© 2006 Optical Society of America

OCIS Codes
(080.1010) Geometric optics : Aberrations (global)
(110.3960) Imaging systems : Microlithography
(260.7200) Physical optics : Ultraviolet, extreme
(340.6720) X-ray optics : Synchrotron radiation

ToC Category:
Physical Optics

History
Original Manuscript: July 18, 2005
Manuscript Accepted: October 21, 2005

Citation
Patrick P. Naulleau, Jason P. Cain, and Kenneth A. Goldberg, "Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator," Appl. Opt. 45, 1957-1963 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-9-1957

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