Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system
Applied Optics, Vol. 46, Issue 16, pp. 3196-3204 (2007)
http://dx.doi.org/10.1364/AO.46.003196
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Abstract
An interferometric lithographic technique and double exposure method are applied to theoretically and experimentally investigate several kinds of 2D periodic structures. The shape, lattice symmetries, and lattice constants of the 2D structures, for different substrate rotational angles, are obtained from the simulated predictions. The shape of the 2D structures can be varied by controlling the rotational angle of the substrate and the development process, and they are validated experimentally. The variation of the lattice symmetry of the 2D structure with the substrate rotational angle is discussed in detail in relation to the axial angle and lattice constant. It is found that square, circular, rectangular, and elliptical scatterers which are arranged in parallelogram, triangular, and square lattices (with different lattice constants) can be obtained. The photonic bandgaps for each condition are also investigated. When the substrate rotational angles are the same, the normalized frequency
© 2007 Optical Society of America
OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.3160) Physical optics : Interference
ToC Category:
Physical Optics
History
Original Manuscript: November 27, 2006
Revised Manuscript: January 26, 2007
Manuscript Accepted: January 30, 2007
Published: May 15, 2007
Citation
Cheng-Wei Chien, Yun-Chih Lee, Po-Shen Lee, Jenq-Yang Chang, and Jyh-Chen Chen, "Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system," Appl. Opt. 46, 3196-3204 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-16-3196
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