Abstract
Ion-beam sputtering (IBS) and evaporation are the two deposition techniques that have been used to deposit coatings of Al protected with with high reflectance in the vacuum ultraviolet down to . Evaporation deposited (ED) Al protected with IBS resulted in a larger (smaller) reflectance below (above) than the well-known all-evaporated coatings. A similar comparison is obtained when the Al film is deposited by IBS instead of evaporation. The lower reflectance of the coatings protected with IBS versus ED above is because of larger absorption of the former. Both nonprotected IBS Al, as well as IBS Al protected with ED , resulted in a band of reflectance loss that was peaked at 127 and , respectively. This result was attributed to the excitation of surface plasmons due to the enhancement of surface roughness with large spatial wave vectors in the sputter deposition. This reflectance loss for IBS Al protected with is small at the short and long wavelengths investigated. IBS Al protected with ED is thus a promising coating for these two spectral regions. Coatings protected with IBS resulted in a reflectance as high as coatings protected with ED at wavelengths longer than , whereas the former had a lower reflectance below this wavelength.
© 2007 Optical Society of America
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