A technique for correction of optical surfaces has recently been reported. The technique involves oscillating an optical surface back and forth behind a multiaperture mask to deposit a spatially varying dielectric layer onto the optic to create the desired surface profile. Details are reported of a modified mask design that inherently smooths the deposited layer used for these corrections. Results are also reported with regard to a recent correction that resulted in a thickness uniformity of better than λ∕2000 rms over a working aperture of 37.5 mm.
© 2007 Optical Society of America
Optical Design and Fabrication
Original Manuscript: June 1, 2007
Manuscript Accepted: July 6, 2007
Published: August 27, 2007
John W. Arkwright, "Design of multiaperture masks for subnanometer correction of ultraprecision optical components," Appl. Opt. 46, 6375-6380 (2007)