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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 28 — Oct. 1, 2007
  • pp: 7018–7025

Grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths

Yao Hu and Lijiang Zeng  »View Author Affiliations

Applied Optics, Vol. 46, Issue 28, pp. 7018-7025 (2007)

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A practical grating mosaic method is proposed based on quantitative image processing of three far-field diffraction intensity patterns in two wavelengths. This method aims at making a perfect mosaic of two planar gratings that can substitute for a single and larger grating without introducing wavefront aberration at any wavelength. The zeroth-order and first-order far-field patterns of one wavelength are analyzed for separating and eliminating the angular mosaic errors. The first-order far-field patterns of two wavelengths are applied for separation of the lateral and longitudinal phase errors. Then the three patterns are considered together to enlarge the target range of coarse adjustment required for further fine adjustment in longitudinal position. Experimentally, angular and positional detection sensitivities of less than 6 μ rad and 14   nm were achieved, respectively, and the periodicity in positional adjustment was checked, which departed less than 1.8% from the theoretical period. The performance of the perfect mosaic grating was diagnosed with the far-field diffraction intensity pattern in a third wavelength, and the necessity for a perfect mosaic was verified.

© 2007 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(100.2960) Image processing : Image analysis
(320.5520) Ultrafast optics : Pulse compression

ToC Category:
Diffraction and Gratings

Original Manuscript: April 12, 2007
Manuscript Accepted: August 10, 2007
Published: September 27, 2007

Yao Hu and Lijiang Zeng, "Grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths," Appl. Opt. 46, 7018-7025 (2007)

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