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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 5 — Feb. 10, 2007
  • pp: 657–663

Fabrication error analysis and experimental demonstration for computer-generated holograms

Ping Zhou and James H. Burge  »View Author Affiliations

Applied Optics, Vol. 46, Issue 5, pp. 657-663 (2007)

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Aspheric optical surfaces are often tested using computer-generated holograms (CGHs). For precise measurement, the wavefront errors caused by the CGH must be known and characterized. A parametric model relating the wavefront errors to the CGH fabrication errors is introduced. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given. The calibration of these effects for a CGH null corrector is demonstrated to cause measurement error less than 1 nm.

© 2007 Optical Society of America

OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(090.2880) Holography : Holographic interferometry
(120.2880) Instrumentation, measurement, and metrology : Holographic interferometry

ToC Category:

Original Manuscript: July 28, 2006
Manuscript Accepted: September 19, 2006
Published: January 25, 2007

Ping Zhou and James H. Burge, "Fabrication error analysis and experimental demonstration for computer-generated holograms," Appl. Opt. 46, 657-663 (2007)

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