Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering
Applied Optics, Vol. 47, Issue 13, pp. C107-C113 (2008)
http://dx.doi.org/10.1364/AO.47.00C107
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Abstract
A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or
© 2008 Optical Society of America
OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films
History
Original Manuscript: August 6, 2007
Manuscript Accepted: September 17, 2007
Published: November 29, 2007
Citation
Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, and Michel Lequime, "Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering," Appl. Opt. 47, C107-C113 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C107
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