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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C214–C218

Fluoride antireflection coatings deposited at 193 nm

Ming-Chung Liu, Cheng-Chung Lee, Bo-Huei Liao, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C214-C218 (2008)
http://dx.doi.org/10.1364/AO.47.00C214


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Abstract

Antireflection coatings for 193 nm composed of low-index ( MgF 2 and AlF 3 ) and high-index ( LaF 3 and GdF 3 ) materials are deposited by the resistive heating boat method at a substrate temperature of 300 °C. The optical characteristics (reflectance and optical loss), microstructure (morphology and surface roughness), stress, and laser-induced damage threshold (LIDT) of the coatings are investigated and discussed. The related reflection at 193 nm of the four kinds of antireflection coatings is smaller than 0.2% and the optical loss is less than 0.15%. Of the fluoride antireflection coatings, AlF 3 GdF 3 had the lowest stress value. Antireflection coatings with AlF 3 as the low-index material had higher LIDT values than when MgF 2 was used.

© 2008 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: July 30, 2007
Manuscript Accepted: October 19, 2007
Published: January 21, 2008

Citation
Ming-Chung Liu, Cheng-Chung Lee, Bo-Huei Liao, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Fluoride antireflection coatings deposited at 193 nm," Appl. Opt. 47, C214-C218 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C214

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