Fluoride antireflection coatings deposited at 193 nm
Applied Optics, Vol. 47, Issue 13, pp. C214-C218 (2008)
http://dx.doi.org/10.1364/AO.47.00C214
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Abstract
Antireflection coatings for 193 nm composed of low-index (
© 2008 Optical Society of America
OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties
History
Original Manuscript: July 30, 2007
Manuscript Accepted: October 19, 2007
Published: January 21, 2008
Citation
Ming-Chung Liu, Cheng-Chung Lee, Bo-Huei Liao, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Fluoride antireflection coatings deposited at 193 nm," Appl. Opt. 47, C214-C218 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C214
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