Abstract
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature range of is introduced. The crystallinity, morphology, composition, thicknesses, refractive indices, and transmittance of the films are analyzed. Low impurity levels are obtained at with good stoichiometry. Refractive indices of 1.34–1.42 for , 1.43 for , and 1.57–1.61 for films are obtained.
© 2008 Optical Society of America
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