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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 16 — Jun. 1, 2008
  • pp: 2906–2914

Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography

Michele Suman, Maria-Guglielmina Pelizzo, Piergiorgio Nicolosi, and David L. Windt  »View Author Affiliations

Applied Optics, Vol. 47, Issue 16, pp. 2906-2914 (2008)

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We have developed novel aperiodic multilayers, covered by capping layers resistant to environmental attack, that offer superior performance for extreme ultraviolet lithography. We have designed these coatings using an optimization procedure based on an algorithm able to acquire domain knowledge inside the space of possible solutions. An integrated intensity increase of up to 2.18 times that obtained using standard periodic multilayers has been estimated. The aperiodic structures have minimal absorption in the topmost layers, which makes them especially insensitive to both the choice of capping layer material and any subsequent capping layer degradation due to oxidation or contamination. This property allows for the use of the most resilient capping layer materials available, thereby leading to a significantly improved lifetime. We have produced prototype capped aperiodic coatings and have measured their performance.

© 2008 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design

ToC Category:
Optical Design and Fabrication

Original Manuscript: January 9, 2008
Revised Manuscript: April 23, 2008
Manuscript Accepted: April 28, 2008
Published: May 21, 2008

Michele Suman, Maria-Guglielmina Pelizzo, Piergiorgio Nicolosi, and David L. Windt, "Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography," Appl. Opt. 47, 2906-2914 (2008)

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  1. P. B. Mirkarimi, S. Bajt, and M. A. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography,” Appl. Opt. 39, 1618-1625, (2000). [CrossRef]
  2. L. E. Klebanoff, P. A. Grunow, S. Graham, W. M. Clift, A. H. Leung, and S. J. Haney, “Environmental data from the Engineering Test Stand,” Proc. SPIE 4688, 310-315(2002). [CrossRef]
  3. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham, “Design and performance of capping layers for extreme-ultraviolet multilayer mirrors,” Appl. Opt. 42, 5750-5758 (2003). [CrossRef] [PubMed]
  4. S. Wurm and K. Kemp, “SEMATECH pushes extreme ultraviolet lithography forward,” http://spie.org/x8865.xml.
  5. S. Graham, C. Steinhaus, W. M. Clift, and L. Klebanoff, “Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics,” J. Vac. Sci. Technol. B 20, 2393-2400 (2002). [CrossRef]
  6. S. Graham, C. E. Steinhaus, W. M. Clift, L. E. Klebanoff, and S. Bajt, “Atomic hydrogen cleaning of EUV multilayer optics,” Proc. SPIE 5037, 236-248 (2003). [CrossRef]
  7. M. Wedowski, S. Bajt, J. A. Folta, E. M. Gullikson, U. Kleineberg, L. E. Klebanoff, M. E. Malinowski, and W. M. Clift, “Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography,” Proc. SPIE 3767, 217-224 (1999). [CrossRef]
  8. S. Oestreich, R. Klein, F. Scholze, J. Jonkers, E. Louis, A. Yakshin, P. Gorts, G. Ulm, M. Haidl, and F. Bijkerk, “Multilayer reflectance during exposure to EUV radiation,” Proc. SPIE 4146, 64-71 (2000). [CrossRef]
  9. K. Motai, H. Oizumi, S. Miyagaki, I. Nishiyama, A. Izumi, T. Ueno, Y. Miyazaki, and A. Namiki, “Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror,” Proc. SPIE 6517 (2007). [CrossRef]
  10. S. Bajt, J. B. Alameda, T. W. Barbee, Jr., W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers,” Opt. Eng. 41, 1797-1804 (2002). [CrossRef]
  11. M. Singh and J. J. M. Braat, “Design of multilayer extreme ultraviolet mirrors for enhanced reflectivity,” Appl. Opt. 39, 2189-2197 (2000). [CrossRef]
  12. J. I. Larruquert, “Sub-quarterwave multilayers with enhanced reflectance at 13.4 and 11.3 nm,” Opt. Commun. 206, 259-273 (2002). [CrossRef]
  13. M. Singh and J. J. M. Braat, “Capping layers for extreme-ultraviolet multilayer interference coatings,” Opt. Lett. , 26, 259-261 (2001). [CrossRef]
  14. S. Bajt, J. B. Alameda, T. W. Barbee, Jr., W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, “Improved reflectance and stability of Mo/Si multilayers soft x-ray and EUV,” Proc. SPIE 4506, 65-71 (2001). [CrossRef]
  15. M. Suman, F. Frassetto, P. Nicolosi, and M.-G. Pelizzo, “Design of aperiodic multilayer structures for attosecond pulses in the EUV,” Appl. Opt. 46, 8159-8169 (2007). [CrossRef] [PubMed]
  16. A. Wonisch, U. Neuhäusler, N. M. Kabachnik, T. Uphues, M. Uiberacker, V. Yakovlev, F. Krausz, M. Drescher, U. Kleineberg, and U. Heinzmann, “Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses,” Appl. Opt. 45, 4147-4156 (2006). [CrossRef] [PubMed]
  17. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, W. M. Clift, A. Aquila, E. M. Gullikson, and N. V. G. Edwards, “Oxidation resistance of Ru-capped EUV multilayers,” Proc. SPIE 5751, 118-127 (2005). [CrossRef]
  18. M. E. Malinowski, C. Steinhaus, W. M. Clift, L. E. Klebanoff, S. Mrowka, and R. Soufli, “Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications,” Proc. SPIE 4688, 442-453 (2002). [CrossRef]
  19. D. L. Windt and W. K. Waskiewicz, “Multilayer facilities for EUV lithography,” J. Vac. Sci. Technol. B 12, 3826-3832 (1994). [CrossRef]

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