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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 17 — Jun. 10, 2008
  • pp: 3177–3184

Two-beam-current method for e-beam writing gray-scale masks and its application to high-resolution microstructures

Zhou Zhou and Sing H. Lee  »View Author Affiliations


Applied Optics, Vol. 47, Issue 17, pp. 3177-3184 (2008)
http://dx.doi.org/10.1364/AO.47.003177


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Abstract

A two-beam-current method is introduced for e-beam writing in the fabrication of gray-scale masks. Compared with the simpler single-current method, the two-beam-current method offers two important advantages: (a) it can achieve a much larger dynamic range for e-beam exposure; (b) the writing time for a gray-scale mask can be reduced when a large pattern is to be written. Here, the new method is first described in detail and its application to the fabrication of our new gray-scale mask is demonstrated. Then, the improved gray-scale masks were employed to fabricate large dynamic range, high-resolution micro-optical elements of less than a couple of micrometers depth, using deep ultraviolet lithography at 248 ‚ÄČ nm wavelength and an inductively coupled plasma reactive ion etching system.

© 2008 Optical Society of America

OCIS Codes
(220.2740) Optical design and fabrication : Geometric optical design
(220.4000) Optical design and fabrication : Microstructure fabrication
(350.3950) Other areas of optics : Micro-optics
(350.4600) Other areas of optics : Optical engineering

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: March 10, 2008
Revised Manuscript: April 30, 2008
Manuscript Accepted: May 1, 2008
Published: June 4, 2008

Citation
Zhou Zhou and Sing H. Lee, "Two-beam-current method for e-beam writing gray-scale masks and its application to high-resolution microstructures," Appl. Opt. 47, 3177-3184 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-17-3177

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