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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 7 — Mar. 1, 2008
  • pp: 1002–1009

Intensity and phase measurements of asymmetric mode profiles and the transform in the near- to far-field transitions

Irshaad Fatadin, David Ives, and Martin Wicks  »View Author Affiliations

Applied Optics, Vol. 47, Issue 7, pp. 1002-1009 (2008)

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A fast and accurate measurement technique employing a calibrated CCD array is described to measure the intensity and phase distributions of the asymmetric mode profiles associated with optical waveguides. A Shack–Hartmaan wavefront sensor incorporated in the system provides the phase information. The transform describing the near-field (NF) to far-field (FF) transitions of the asymmetric mode profiles is investigated both experimentally and theoretically. The simulated NF to FF transitions using the transform are compared with the measured profiles at different positions from the end face of the waveguide. Good agreement is obtained between the measured and the computed profiles proving the accuracy of the measurement technique and also the transform used for propagation of the asymmetric mode profiles.

© 2008 Optical Society of America

OCIS Codes
(040.1520) Detectors : CCD, charge-coupled device
(060.2310) Fiber optics and optical communications : Fiber optics
(230.7370) Optical devices : Waveguides

ToC Category:
Integrated Optics

Original Manuscript: October 31, 2007
Manuscript Accepted: January 3, 2008
Published: February 29, 2008

Irshaad Fatadin, David Ives, and Martin Wicks, "Intensity and phase measurements of asymmetric mode profiles and the transform in the near- to far-field transitions," Appl. Opt. 47, 1002-1009 (2008)

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