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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 13 — May. 1, 2009
  • pp: 2473–2479

Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique

Cheng Yi Wu, Ting Hsuan Chiang, Ngoc Diep Lai, Danh Bich Do, and Chia Chen Hsu  »View Author Affiliations


Applied Optics, Vol. 48, Issue 13, pp. 2473-2479 (2009)
http://dx.doi.org/10.1364/AO.48.002473


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Abstract

Microlens arrays (MLAs) were fabricated based on the mass transport effect of SU-8 photoresist by a multiexposure two-beam interference technique. In particular, a direct single-step fabrication process, i.e., without developing, mask, and pattern transferring processes, is demonstrated. The effects of various parameters such as thicknesses, exposure dosage, and angle between two laser beams on MLAs were investigated. Square and hexagonal lattices of microlenses were obtained by controlling rotation angles between different exposures on SU-8 samples. In addition, microlenses with elliptical shape were fabricated by a double exposure at 0 ° and 60 ° . Finally, the surface profiles of microlenses in MLAs were characterized by atomic force microscopy.

© 2009 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(260.3160) Physical optics : Interference

ToC Category:
Holography

History
Original Manuscript: February 11, 2009
Revised Manuscript: April 8, 2009
Manuscript Accepted: April 10, 2009
Published: April 24, 2009

Citation
Cheng Yi Wu, Ting Hsuan Chiang, Ngoc Diep Lai, Danh Bich Do, and Chia Chen Hsu, "Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique," Appl. Opt. 48, 2473-2479 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-13-2473

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