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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 2 — Jan. 10, 2009
  • pp: 261–269

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, and Fan Wang  »View Author Affiliations


Applied Optics, Vol. 48, Issue 2, pp. 261-269 (2009)
http://dx.doi.org/10.1364/AO.48.000261


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Abstract

The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark’s structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p = 1.92 λ / NA and p w = 2 p / 3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z 7 and Z 14 apparently increase.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.3960) Imaging systems : Microlithography
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Imaging Systems

History
Original Manuscript: August 11, 2008
Revised Manuscript: October 20, 2008
Manuscript Accepted: November 19, 2008
Published: January 7, 2009

Citation
Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, and Fan Wang, "Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width," Appl. Opt. 48, 261-269 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-2-261

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