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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 23 — Aug. 10, 2009
  • pp: 4536–4544

Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering

Eda Çetinörgü, Bill Baloukas, Oleg Zabeida, Jolanta E. Klemberg-Sapieha, and Ludvik Martinu  »View Author Affiliations


Applied Optics, Vol. 48, Issue 23, pp. 4536-4544 (2009)
http://dx.doi.org/10.1364/AO.48.004536


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Abstract

Mechanical and thermoelastic properties of optical films are very important to ensure the performance of optical interference filters and optical coating systems. We systematically study the growth and the mechanical and thermoelastic characteristics of niobium oxide ( Nb 2 O 5 ), tantalum oxide ( Ta 2 O 5 ), and silicon dioxide ( Si O 2 ) thin films prepared by dual ion beam sputtering. First, we investigate the stress (σ), hardness (H), reduced Young’s modulus ( E r ), and scratch resistance. Second, we focus on the methodology and assessment of the coefficient of thermal expansion (CTE) and Poisson’s ratio (ν) using the two-substrate method. For the high refractive index films, namely, Nb 2 O 5 ( n a t 550 nm = 2.30 ) and Ta 2 O 5 ( n at 550 nm = 2.13 ), we obtained H 6 GPa , E r 125 GPa , CTE = 4.9 × 10 6 ° C 1 , ν = 0.22 , and H 7 GPa , E r 133 GPa , CTE = 4.4 × 10 6 ° C 1 , and ν = 0.27 , respectively. In comparison, for Si O 2 ( n at 550 nm = 1.48 ), these values are H 9.5 GPa , E r 87 GPa , CTE = 2.1 × 10 6 ° C 1 , and ν = 0.11 . Correlations between the growth conditions (secondary beam ion energy and ion current), the micro structure, and the film properties are discussed.

© 2009 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

History
Original Manuscript: March 4, 2009
Revised Manuscript: June 29, 2009
Manuscript Accepted: June 30, 2009
Published: August 3, 2009

Citation
Eda Çetinörgü, Bill Baloukas, Oleg Zabeida, Jolanta E. Klemberg-Sapieha, and Ludvik Martinu, "Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering," Appl. Opt. 48, 4536-4544 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-23-4536

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