Conditions for primitive-lattice-vector-direction equal contrasts in four-beam-interference lithography
Applied Optics, Vol. 48, Issue 24, pp. 4801-4813 (2009)
http://dx.doi.org/10.1364/AO.48.004801
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Abstract
Four distinct conditions for primitive-lattice-vector-direction equal contrasts in four-beam interference are introduced and described. By maximizing the absolute contrast subject to an equal contrast condition, lithographically useful interference patterns are found. Each condition is described in terms of the corresponding constraints on the plane wave wave vectors, polarizations, and intensities. The resulting locations of global intensity maxima, minima, and saddle points are presented. Subordinate conditions for unity absolute contrast are also developed. Three lattices are treated for each condition: simple cubic, face-centered cubic, and body-centered cubic.
© 2009 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(110.4235) Imaging systems : Nanolithography
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(050.5298) Diffraction and gratings : Photonic crystals
ToC Category:
Diffraction and Gratings
History
Original Manuscript: April 9, 2009
Manuscript Accepted: July 28, 2009
Published: August 19, 2009
Citation
Justin L. Stay and Thomas K. Gaylord, "Conditions for primitive-lattice-vector-direction equal contrasts in four-beam-interference lithography," Appl. Opt. 48, 4801-4813 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-24-4801
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