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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 29 — Oct. 10, 2009
  • pp: 5502–5508

Performance optimization of Si/Gd extreme ultraviolet multilayers

David L. Windt, Jeffrey A. Bellotti, Benjawan Kjornrattanawanich, and John F. Seely  »View Author Affiliations


Applied Optics, Vol. 48, Issue 29, pp. 5502-5508 (2009)
http://dx.doi.org/10.1364/AO.48.005502


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Abstract

We compare the performance, stability and microstructure of Si/Gd multilayers containing thin barrier layers of W, B 4 C , or Si N x , and determine that multilayers containing 0.6 nm thick W barrier layers at each interface provide the best compromise between high peak reflectance in the extreme ultraviolet near λ = 60 nm and good stability upon heating. The Si/W/Gd films have sharper interfaces and also show vastly superior thermal stability relative to Si/Gd multilayers without barrier layers. We find that these structures have relatively small compressive film stresses, and show good temporal stability thus far. We measured a peak reflectance of 29.7% at λ = 62.5 nm , and a spectral bandpass of Δ λ = 9 nm (FWHM), for an optimized Si/W/Gd multilayer having a period d = 32.0 nm .

© 2009 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties
(340.0340) X-ray optics : X-ray optics
(350.1260) Other areas of optics : Astronomical optics

ToC Category:
Optical Devices

History
Original Manuscript: July 17, 2009
Revised Manuscript: September 14, 2009
Manuscript Accepted: September 15, 2009
Published: October 1, 2009

Citation
David L. Windt, Jeffrey A. Bellotti, Benjawan Kjornrattanawanich, and John F. Seely, "Performance optimization of Si/Gd extreme ultraviolet multilayers," Appl. Opt. 48, 5502-5508 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-29-5502

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