Abstract

We design and manufacture a fused-silica polarization-independent two-port beam splitter grating. The physical mechanism of this deeply etched grating can be shown clearly by using the simplified modal method with consideration of corresponding accumulated phase difference of two excited propagating grating modes, which illustrates that the binary-phase fused-silica grating structure depends little on the incident wavelength, but mainly on the ratio of groove depth to grating period and the ratio of incident wavelength to grating period. These analytic results would also be very helpful for wavelength bandwidth analysis. The exact grating profile is optimized by using the rigorous coupled-wave analysis. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results agree well with the theoretical values.

© 2009 Optical Society of America

Design and fabrication of a polarization-independent wideband transmission fused-silica grating

Hongchao Cao, Changhe Zhou, Jijun Feng, Peng Lu, and Jianyong Ma
Appl. Opt. 49(21) 4108-4112 (2010)

Dual-function beam splitter of a subwavelength fused-silica grating

Jijun Feng, Changhe Zhou, Jiangjun Zheng, Hongchao Cao, and Peng Lv
Appl. Opt. 48(14) 2697-2701 (2009)

Unified design of sinusoidal-groove fused-silica grating

Jijun Feng, Changhe Zhou, Hongchao Cao, and Peng Lu
Appl. Opt. 49(30) 5697-5704 (2010)

Deep-etched sinusoidal polarizing beam splitter grating

Jijun Feng, Changhe Zhou, Hongchao Cao, and Peng Lv
Appl. Opt. 49(10) 1739-1743 (2010)

Three-port beam splitter of a binary fused-silica grating

Jijun Feng, Changhe Zhou, Bo Wang, Jiangjun Zheng, Wei Jia, Hongchao Cao, and Peng Lv
Appl. Opt. 47(35) 6638-6643 (2008)