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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 48, Iss. 32 — Nov. 10, 2009
  • pp: 6252–6258

Self-images location of amplitude/phase binary gratings

Francisco Jose Torcal-Milla, Luis Miguel Sanchez-Brea, and Francisco Javier Salgado-Remacha  »View Author Affiliations

Applied Optics, Vol. 48, Issue 32, pp. 6252-6258 (2009)

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We analyze the near-field behavior of binary amplitude/phase diffraction gratings, which modulate at the same time the amplitude and phase of the incident light beam. As it is expected, the distance between two consecutive self-images of the grating depends only on the period of the grating and the wavelength of the illumination. However, the location of the self-images depends on the specific properties of the grating. In this work, we analyze the location of the self-images in terms of the Fourier coefficients of the grating, obtaining analytical expressions. This analysis can be useful in applications in which the position of the self-images must be at certain fixed distances from the grating. Finally, an experimental and numerical verification of the proposed theory is performed.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings
(220.4610) Optical design and fabrication : Optical fabrication
(260.1960) Physical optics : Diffraction theory

ToC Category:
Diffraction and Gratings

Original Manuscript: June 4, 2009
Revised Manuscript: October 14, 2009
Manuscript Accepted: October 20, 2009
Published: November 4, 2009

Francisco Jose Torcal-Milla, Luis Miguel Sanchez-Brea, and Francisco Javier Salgado-Remacha, "Self-images location of amplitude/phase binary gratings," Appl. Opt. 48, 6252-6258 (2009)

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