Simple method for determination of the thickness of a nonabsorbing thin film using spectral reflectance measurement
Applied Optics, Vol. 48, Issue 5, pp. 985-989 (2009)
http://dx.doi.org/10.1364/AO.48.000985
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Abstract
A method to determine the thickness of a nonabsorbing thin film on an absorbing substrate is presented. A linear relation between the thin-film thickness and the tangent wavelength of the reflectance spectrum for a specific interference order is revealed, which permits the calculation of the thickness provided that the wavelength-dependent optical parameters of the thin film and the substrate are known. The thickness can be calculated precisely from the reflectance spectrum by using one extreme only, as is demonstrated theoretically for
© 2009 Optical Society of America
OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(240.0310) Optics at surfaces : Thin films
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: December 1, 2008
Revised Manuscript: January 12, 2009
Manuscript Accepted: January 12, 2009
Published: February 5, 2009
Citation
Jiři Luňáček, Petr Hlubina, and Milena Luňáčková, "Simple method for determination of the thickness of a nonabsorbing thin film using spectral reflectance measurement," Appl. Opt. 48, 985-989 (2009)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-48-5-985
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